Micron Technology, Inc.
Assemblies Having Conductive Structures with Three or More Different Materials

Last updated:

Abstract:

Some embodiments include a memory array having a vertical stack of alternating insulative levels and control gate levels. Channel material extends vertically along the stack. The control gate levels comprising conductive regions. The conductive regions include at least three different materials. Charge-storage regions are adjacent the control gate levels. Charge-blocking regions are between the charge-storage regions and the conductive regions.

Status:
Application
Type:

Utility

Filling date:

19 Feb 2021

Issue date:

1 Jul 2021