Micron Technology, Inc.
APPARATUSES AND METHODS FOR DETERMINING WAFER DEFECTS

Abstract:

An inspection system for determining wafer defects in semiconductor fabrication may include an image capturing device to capture a wafer image and a classification convolutional neural network (CNN) to determine a classification from a plurality of classes for the captured image. Each of the plurality of classes indicates a type of a defect in the wafer. The system may also include an encoder to encode to convert a training image into a feature vector; a cluster system to cluster the feature vector to generate soft labels for the training image; and a decoder to decode the feature vector into a re-generated image. The system may also include a classification system to determine a classification from the plurality of classes for the training image. The encoder and decoder may he formed from a CNN autoencoder. The classification CNN and the CNN autoencoder may each be a deep neural network.