Photronics, Inc.
SYSTEM, METHOD, AND PROGRAM PRODUCT FOR MANUFACTURING A PHOTOMASK
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Abstract:
Methods and systems for building a photomask from obtained pattern information relating to a photomask that exhibits defects on wafer. Spatial domain analysis is conducted on the pattern information so that corrective photomask structures can be generated and applied to a photomask layout. A photomask is built using the corrective photomask structures. The photomask is verified for effectiveness.
Status:
Application
Type:
Utility
Filling date:
30 Apr 2021
Issue date:
4 Nov 2021