QUALCOMM Incorporated
Air gap underneath passive devices
Last updated:
Abstract:
Certain aspects of the present disclosure generally relate to a semiconductor device including an air gap underneath passive devices. The semiconductor device generally includes a substrate layer, a passive device layer, and a dielectric layer disposed between the substrate layer and the passive device layer, wherein the dielectric layer includes an air gap disposed beneath at least one passive device in the passive device layer.
Status:
Grant
Type:
Utility
Filling date:
7 Nov 2019
Issue date:
29 Mar 2022