QUALCOMM Incorporated
STACKED INDUCTOR HAVING A DISCRETE METAL-STACK PATTERN
Last updated:
Abstract:
An inductor includes a first metallization layer multi-turn trace. The inductor also includes a second metallization layer multi-turn trace coupled to the first metallization layer multi-turn trace through at least one first via. The inductor further includes a plurality of discrete third metallization layer trace segments coupled to the second metallization layer multi-turn trace through a plurality of second vias.
Status:
Application
Type:
Utility
Filling date:
8 Mar 2021
Issue date:
8 Sep 2022