QUALCOMM Incorporated
STACKED INDUCTOR HAVING A DISCRETE METAL-STACK PATTERN

Last updated:

Abstract:

An inductor includes a first metallization layer multi-turn trace. The inductor also includes a second metallization layer multi-turn trace coupled to the first metallization layer multi-turn trace through at least one first via. The inductor further includes a plurality of discrete third metallization layer trace segments coupled to the second metallization layer multi-turn trace through a plurality of second vias.

Status:
Application
Type:

Utility

Filling date:

8 Mar 2021

Issue date:

8 Sep 2022