RTX Corporation
METHOD FOR METAL VAPOR INFILTRATION OF CMC PARTS AND ARTICLES CONTAINING THE SAME

Last updated:

Abstract:

A method comprises discharging from a metal vaporization device a vapor of a metal or a metal precursor to a chemical vapor infiltration device where the chemical vapor infiltration device is in fluid communication with the metal vaporization device. The chemical vapor infiltration device contains a preform containing ceramic fibers. The preform is infiltrated with a metallic coating or a coating of a metallic precursor along with a ceramic precursor coating. The metallic coating and/or the metallic precursor coating and the ceramic precursor coating are applied sequentially or simultaneously.

Status:
Application
Type:

Utility

Filling date:

23 Dec 2020

Issue date:

23 Jun 2022