Synopsys, Inc.
SKELETON REPRESENTATION OF LAYOUTS FOR THE DEVELOPMENT OF LITHOGRAPHIC MASKS

Abstract:

In certain embodiments, a method includes the following steps. A layout used in a lithographic mask development process is accessed. For example, the layout may be the layout of the mask itself, or it may be the layout of the resulting printed pattern on the wafer. The layout includes a number of disjoint shapes. Skeleton representations for at least some of the disjoint shapes in the layout are determined. The skeleton representation of an individual shape has elements of two or more nodes connected by edges. It also includes size parameters for at least some of the elements. The skeleton representations of the shapes are used in the mask development process.