Synopsys, Inc.
NET-BASED WAFER INSPECTION

Abstract:

A defect map may be created by merging defects at locations on multiple dies that include copies of an integrated circuit (IC). Layout shapes or nets may be determined that overlap with the defects in the defect map. Next, connectivity between the layout shapes or nets may be determined. The defects may then be grouped into defect groups based on the connectivity between the layout shapes or nets, where each defect group comprises defects that overlap with layout shapes or nets that are electrically connected to each other.