Synopsys, Inc.
NEURAL NETWORK BASED MASK SYNTHESIS FOR INTEGRATED CIRCUITS

Abstract:

A system uses machine learning models, such as neural networks for generating mask design from a circuit design. The machine learning models have inputs and outputs which are localized to a small region of the circuit design. The machine learning model takes as input features describing the circuit design in the neighborhood of a location and generates an offset distance as output. The system uses the offset distance to generate features of the mask design, for example, main features or assist features corresponding to a circuit design polygon. The system may use the offset distance for target optimization by modifying the circuit design polygon to obtain a circuit design polygon that has improved manufacturability.