Synopsys, Inc.
Determination of dimensional changes of features across mask pattern simulation fields

Abstract:

A method of determining dimensional changes of features in a mask involves calculating a spacing to be used between adjacent unit cells, correcting a unit cell surrounded by replicas of the same unit cell at the calculated spacing for optical proximity effects, arraying the proximity corrected unit cell at the calculated spacing, and dividing the array of unit cells into templates. Each template frames a portion of the array of unit cells, and locations of the unit cells in each framed template are shifted relative to locations of the unit cells in other framed templates. Critical dimensions for features in the unit cell are determined within each template, and the critical dimensions determined across the template are used to obtain shift variances of each feature. A dimensional change is determined for a feature based on the shift variance for that feature.