Sony Group Corporation
Field-effect transistor, method of manufacturing the same, and radio-frequency device

Last updated:

Abstract:

There is provided a field-effect transistor including: a gate electrode; a semiconductor layer having a source region and a drain region with the gate electrode in between; contact plugs provided on the source region and the drain region; first metals stacked on the contact plugs; and a low-dielectric constant region provided in a region between the first metals along an in-plane direction of the semiconductor layer and provided at least in a first region below bottom surfaces of the first metals along a stacking direction.

Status:
Grant
Type:

Utility

Filling date:

6 Oct 2020

Issue date:

12 Jul 2022