Tower Semiconductor Ltd.
SOLID-STATE IMAGING DEVICE

Abstract:

A solid-state imaging device includes a first semiconductor substrate, photoelectric conversion portions arrayed on the first semiconductor substrate and configured to convert incident light to charges, a charge storage portion configured to hold charges transferred from a corresponding one of the photoelectric conversion portions via a transfer transistor, and an interconnect layer stacked on the first semiconductor substrate and including a plurality of metal interconnects. The incident light enters the first semiconductor substrate from a back surface side that is an opposite side to the interconnect layer. The solid-state imaging device further includes a light absorbing film between the photoelectric conversion portions and the metal interconnects.