Taiwan Semiconductor Manufacturing Company Limited
PHASE-CHANGE RANDOM ACCESS MEMORY DEVICE AND METHOD OF MAKING THE SAME

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Abstract:

A phase-change memory device and method of manufacturing the same, the memory device including: a substrate; a bottom electrode disposed over the substrate; a top electrode disposed over the bottom electrode; and a phase-change layer disposed between the top and bottom electrodes. The phase change layer includes a chalcogenide Ge--Sb--Te (GST) material that includes at least 30 at % Ge and that is doped with a dopant including N, Si, Sc, Ga, C, or any combination thereof.

Status:
Application
Type:

Utility

Filling date:

7 Feb 2020

Issue date:

12 Aug 2021