Taiwan Semiconductor Manufacturing Company Limited
Semiconductor device having magnetic tunnel junction (MTJ) stack

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Abstract:

A semiconductor device is provided. The semiconductor device has a semiconductor layer including a source/drain region, a first magnetic layer over the semiconductor layer, and a first dielectric layer over the source/drain region and adjacent the first magnetic layer. The semiconductor device has a metal structure extending through the first dielectric layer, a second magnetic layer over the metal structure, and a second dielectric layer over the first magnetic layer and adjacent the first dielectric layer.

Status:
Grant
Type:

Utility

Filling date:

1 May 2019

Issue date:

21 Sep 2021