Taiwan Semiconductor Manufacturing Company Limited
 Semiconductor device having magnetic tunnel junction (MTJ) stack
 Last updated:
Abstract:
A semiconductor device is provided. The semiconductor device has a semiconductor layer including a source/drain region, a first magnetic layer over the semiconductor layer, and a first dielectric layer over the source/drain region and adjacent the first magnetic layer. The semiconductor device has a metal structure extending through the first dielectric layer, a second magnetic layer over the metal structure, and a second dielectric layer over the first magnetic layer and adjacent the first dielectric layer.
Status: 
 
                        Grant 
Type: 
 Utility
Filling date: 
 1 May 2019
Issue date: 
21 Sep 2021