Taiwan Semiconductor Manufacturing Company Limited
Semiconductor device with buffer layer and method of forming
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Abstract:
A semiconductor device includes a pixel array comprising a first pixel and a second pixel. The semiconductor device includes a metal structure overlying a portion of a substrate between the first pixel and the second pixel. The semiconductor device includes a first barrier layer adjacent a sidewall of the metal structure. The semiconductor device includes a passivation layer adjacent a sidewall of the first barrier layer. The first barrier layer is between the passivation layer and the metal structure.
Status:
Grant
Type:
Utility
Filling date:
17 Sep 2019
Issue date:
30 Nov 2021