Taiwan Semiconductor Manufacturing Company Limited
 Semiconductor device with buffer layer and method of forming
 Last updated:
Abstract:
A semiconductor device includes a pixel array comprising a first pixel and a second pixel. The semiconductor device includes a metal structure overlying a portion of a substrate between the first pixel and the second pixel. The semiconductor device includes a first barrier layer adjacent a sidewall of the metal structure. The semiconductor device includes a passivation layer adjacent a sidewall of the first barrier layer. The first barrier layer is between the passivation layer and the metal structure.
Status: 
 
                        Grant 
Type: 
 Utility
Filling date: 
 17 Sep 2019
Issue date: 
30 Nov 2021