Taiwan Semiconductor Manufacturing Company Limited
 IMAGE SENSOR DEVICE AND METHODS OF FORMING THE SAME
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Abstract:
A method includes forming a plurality of openings extending into a substrate from a front surface of the substrate. The substrate includes a first semiconductor material. Each of the plurality of openings has a curve-based bottom surface. The method includes filling the plurality of openings with a second semiconductor material. The second semiconductor material is different from the first semiconductor material. The method includes forming a plurality of pixels that are configured to sense light in the plurality of openings, respectively, using the second semiconductor material.
Status: 
 
                        Application 
Type: 
 Utility
Filling date: 
 15 Jun 2020
Issue date: 
16 Dec 2021