Taiwan Semiconductor Manufacturing Company Limited
MEMORY CELL WITH LOW RESISTANCE TOP ELECTRODE CONTACT AND METHODS FOR FORMING THE SAME
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Abstract:
A magnetic tunnel junction (MTJ) memory cell comprising a connection via structure, a bottom electrode disposed on the connection via structure, a memory material stack disposed on the bottom electrode, and a conductive contact structure disposed on the memory material stack, in which a bottom surface of the conductive contact structure is in direct contact with a memory material layer of the memory material stack.
Status:
Application
Type:
Utility
Filling date:
14 Apr 2021
Issue date:
23 Dec 2021