Taiwan Semiconductor Manufacturing Company Limited
Semiconductor device and method of formation

Last updated:

Abstract:

A semiconductor device includes a channel region between a source region and a drain region, a gate over the channel region, a dielectric layer over the gate, a capacitive field plate over the dielectric layer, and a word line electrically coupled to the capacitive field plate.

Status:
Grant
Type:

Utility

Filling date:

13 Jul 2020

Issue date:

9 Aug 2022