Taiwan Semiconductor Manufacturing Company Limited
Semiconductor device and method of formation
Last updated:
Abstract:
A semiconductor device includes a channel region between a source region and a drain region, a gate over the channel region, a dielectric layer over the gate, a capacitive field plate over the dielectric layer, and a word line electrically coupled to the capacitive field plate.
Status:
Grant
Type:
Utility
Filling date:
13 Jul 2020
Issue date:
9 Aug 2022