Taiwan Semiconductor Manufacturing Company Limited
SYSTEM AND METHODS FOR CONTROLLING AN AMOUNT OF PRIMER IN A PRIMER APPLICATION GAS

Abstract:

A system for controlling an amount of primer in a primer application gas, includes a first sensor for detecting a first content in the primer application gas that is fed into a chamber containing a semiconductor wafer, a second sensor for detecting a second content in an exhaust gas that is exhausted from the chamber, and a flow control device that controls the amount of primer in the primer application gas based on a first sensor signal from the first sensor and a second sensor signal from the second sensor.