Taiwan Semiconductor Manufacturing Company Limited
High resistance virtual anode for electroplating cell

Last updated:

Abstract:

A high resistance virtual anode for an electroplating cell includes a first layer and a second layer. The first layer includes a plurality of first holes through the first layer. The second layer is over the first layer and includes a plurality of second holes through the second layer.

Status:
Grant
Type:

Utility

Filling date:

30 Nov 2018

Issue date:

30 Jun 2020