Taiwan Semiconductor Manufacturing Company Limited
High resistance virtual anode for electroplating cell
Last updated:
Abstract:
A high resistance virtual anode for an electroplating cell includes a first layer and a second layer. The first layer includes a plurality of first holes through the first layer. The second layer is over the first layer and includes a plurality of second holes through the second layer.
Status:
Grant
Type:
Utility
Filling date:
30 Nov 2018
Issue date:
30 Jun 2020