Taiwan Semiconductor Manufacturing Company Limited
Antifuse array and method of forming antifuse using anodic oxidation
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Abstract:
A method for forming an antifuse on a substrate is provided, which comprises: forming a first conductive material on the substrate; placing the first conductive material in an electrolytic solution; performing anodic oxidation on the first conductive material to form a nanowire made of the first conductive material and surrounded by a first dielectric material formed during the anodic oxidation and to form the antifuse on the nanowire; and forming a second conductive material on the antifuse to sandwich the antifuse between the first conductive material and the second conductive material.
Status:
Grant
Type:
Utility
Filling date:
29 Mar 2018
Issue date:
10 Dec 2019