Taiwan Semiconductor Manufacturing Company Limited
Hybrid Fin Field-Effect Transistor Cell Structures and Related Methods

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Abstract:

In one embodiment, an integrated circuit cell includes a first circuit component and a second circuit component. The first circuit component includes fin field-effect transistors (finFETs) formed in a high fin portion of the integrated circuit cell, the high fin portion of the integrated circuit including a plurality of fin structures arranged in rows. The second circuit component that includes finFETs formed in a less fin portion of the integrated circuit cell, the less fin portion of the integrated circuit including a lesser number of fin structures than the high fin portion of the integrated circuit cell.

Status:
Application
Type:

Utility

Filling date:

24 Sep 2020

Issue date:

7 Jan 2021