Texas Instruments Incorporated
FIN TRANSISTORS WITH DOPED CONTROL LAYER FOR JUNCTION CONTROL

Abstract:

In a described example, an integrated circuit includes a substrate of a semiconductor material, a source region, a gate region, a drain region and a fin structure formed on the substrate. The fin structure includes the gate region, the source region and a drift region between the gate region and the drain region. A doped control layer is formed along at least one sidewall of the fin structure over the drift region.