Texas Instruments Incorporated
IC with thin film resistor with metal walls

Last updated:

Abstract:

An integrated circuit (IC) includes a substrate having a semiconductor surface layer with functional circuitry for realizing at least one circuit function, with an inter level dielectric (ILD) layer on a metal layer that is above the semiconductor surface layer. A thin film resistor (TFR) including a TFR layer is on the ILD layer. At least one vertical metal wall is on at least two sides of the TFR. The metal walls include at least 2 metal levels coupled by filled vias. The functional circuitry is outside the metal walls.

Status:
Grant
Type:

Utility

Filling date:

17 Aug 2020

Issue date:

23 Aug 2022