KLA Corporation
THICK PHOTO RESIST LAYER METROLOGY TARGET
Last updated:
Abstract:
A metrology target includes a first target structure formed within at least one of a first area and a third area of a first layer of a sample, where the first target structure comprises a plurality of first cells containing one or more first cell pattern elements; and a second target structure formed within at least one of a second area and a fourth area of a second layer of the sample, the second target structure comprising a plurality of second cells containing one or more second cell pattern elements.
Status:
Application
Type:
Utility
Filling date:
18 Aug 2020
Issue date:
1 Jul 2021