KLA Corporation
Systems and Methods for MOKE Metrology with Consistent MRAM Die Orientation

Abstract:

A metrology tool includes a magnet to generate a magnetic field and a stage system to position a plurality of MRAM dies on an MRAM wafer in the magnetic field. The stage system includes a chuck on which to mount the MRAM wafer. The metrology tool further includes optics to provide a laser beam and direct the laser beam to be incident upon respective MRAM dies positioned in the magnetic field. The metrology tool additionally includes a detector to receive the laser beam as reflected by the respective MRAM dies and to measure rotation of the polarization of the reflected laser beam. The metrology tool is configurable to provide each MRAM die on the MRAM wafer with a common orientation with respect to the polarization of the laser beam.