KLA Corporation
PARAMETER-STABLE MISREGISTRATION MEASUREMENT AMELIORATION IN SEMICONDUCTOR DEVICES

Abstract:

A parameter-stable misregistration measurement amelioration system and method including providing a wafer, including a plurality of multi-layered semiconductor devices formed thereon, selected from a batch wafers intended to be identical, using a misregistration metrology tool to measure misregistration at multiple sites between at least a first layer and a second layer of the wafer, using a plurality of sets of measurement parameters, thereby generating measured misregistration data for each of the sets of measurement parameters, identifying and removing a parameter-dependent portion and a mean error portion from the measured misregistration data for the wafer for each of the sets of measurement parameters, thereby generating ameliorated parameter-stable ameliorated misregistration data for the wafer.