Lam Research Corporation
PLASMA PROCESSING CHAMBER
Last updated:
Abstract:
A component for use as part of a plasma processing chamber for processing a wafer is provided. The component comprises a component body of silicon carbide doped with at least one of tungsten, tantalum, or boron.
Status:
Application
Type:
Utility
Filling date:
27 Sep 2019
Issue date:
6 Jan 2022