Lam Research Corporation
SixNy AS A NUCLEATION LAYER FOR SiCxOy

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Abstract:

In one embodiment, the disclosed subject matter is a method to produce a substantially uniform, silicon-carbide layer over both dielectric materials and metal materials. In one example, the method includes forming a silicon-nitride layer over the dielectric materials and the metal materials, and forming the silicon carbide layer over the silicon-nitride layer. Other methods are disclosed.

Status:
Application
Type:

Utility

Filling date:

5 May 2020

Issue date:

28 Jul 2022