Lam Research Corporation
MODEL-BASED CONTROL OF SUBSTRATE PROCESSING SYSTEMS

Abstract:

A system for controlling a parameter of a plant associated with a substrate processing chamber is disclosed. A measuring module measures a response of the plant associated with the substrate processing chamber when the parameter of the plant is changed. A model generating module determines a delay and a gain of the plant based on the response. The model generating module generates a model of the plant based on the delay, the gain, and a time constant of the plant. A predicting module receives a set point for the parameter and a measurement of the parameter, generates a prediction of a delay-free value of the parameter based on the set point for the parameter and the measurement of the parameter using the model, compares the prediction with the set point to generate a control signal, and controls the parameter of the plant based on the control signal.