Lam Research Corporation
CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION

Abstract:

A Chemical Vapor Deposition (CVD) tool providing more even flow and distribution of reagent gasses over a substrate. The CVD tool includes a processing chamber and a shower head. The shower head includes a gas dispensing surface having multiple hole patterns that are preferably, but not exclusively, non-symmetrical patterns that mitigate or eliminate lines or symmetry. Such hole patterns include are a variety of different types of spirals or close approximations thereof, include, but are not limited to, Archimedean, Vogel or Fermat spirals.