Lam Research Corporation
AMMONIA PRE-TREATMENT TO PROMOTE AMORPHOUS SILICON ADHESION TO ALUMINUM NITRIDE

Abstract:

A method for depositing an amorphous film includes providing, in a substrate processing chamber, a substrate including an aluminum nitride layer and performing a pre-treatment process to condition an upper surface of the aluminum nitride layer. Performing the pre-treatment process includes supplying a gas mixture including ammonia into the substrate processing chamber and activating plasma within the substrate processing chamber to condition the upper surface of the aluminum nitride layer. The method further includes depositing the amorphous film onto the aluminum nitride layer.