Lam Research Corporation
In situ vapor deposition polymerization to form polymers as precursors to viscoelastic fluids for particle removal from substrates

Abstract:

A method for cleaning a substrate includes supplying a vapor to a processing chamber to grow a polymer film on a substrate in the processing chamber; adding a solution to the polymer film on the substrate to create a viscoelastic fluid on the substrate; and removing the viscoelastic fluid to remove particle contaminants from the substrate.