Lam Research Corporation
Components such as edge rings including chemical vapor deposition (CVD) diamond coating with high purity SP3 bonds for plasma processing systems

Abstract:

A pedestal for a plasma processing system includes a substrate supporting surface. An annular edge ring is arranged around a periphery of the substrate supporting surface. A chemical vapor deposition (CVD) diamond coating is arranged on a plasma-exposed surface of the annular edge ring. The CVD diamond coating includes sp3 bonds. A purity of the sp3 bonds in the diamond coating is greater than 90%.