Lam Research Corporation
Model-based control of substrate processing systems

Abstract:

A system for controlling a parameter of a plant associated with a substrate processing chamber is disclosed. A measuring circuit measures a response of the plant associated with the substrate processing chamber when the parameter of the plant is changed. A model generating circuit determines a delay and a gain of the plant based on the response. The model generating circuit generates a model of the plant based on the delay, the gain, and a time constant of the plant. A predicting circuit receives a set point for the parameter and a measurement of the parameter, generates a value of a prediction of the parameter based on the set point for the parameter and the measurement of the parameter using the model, wherein the value of the prediction of the parameter does not include the delay, compares the value of the prediction of the parameter with the set point to generate a control signal, and controls the parameter of the plant based on the control signal.