Lam Research Corporation
Tungsten for wordline applications

Abstract:

Disclosed herein are methods and related apparatus for formation of multi-component tungsten-containing films including multi-component tungsten-containing films diffusion barriers. According to various embodiments, the methods involve deposition of multi-component tungsten-containing films using tungsten chloride (WCl.sub.x) precursors and boron (B)-containing, silicon (Si)-containing or germanium (Ge)-containing reducing agents.