Apple Inc.
Film-based image sensor with suppressed light reflection and flare artifact

Abstract:

An imaging apparatus includes a semiconductor substrate and a stack of layers of one or more dielectric materials and one or more conducting materials formed on the semiconductor substrate so as to define an array of pixel circuits including respective pixel electrodes at an upper layer of the stack of layers of one or more dielectric materials and one or more conducting materials and logic circuitry in an area adjacent to the array of pixel circuits. A light-absorbing layer is formed on the upper layer of the stack of layers of one or more dielectric materials and one or more conducting materials so as to overlie the area containing the logic circuitry and configured to absorb at least 90% of light that is incident on the light-absorbing layer. A layer of a photosensitive medium overlies the pixel electrodes.