Apple Inc.
Electron beam conditioning

Abstract:

The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.