Advanced Energy Industries, Inc.
Frequency Tuning for Modulated Plasma Systems

Last updated:

Abstract:

Plasma processing and power supply systems and methods are disclosed. The plasma processing system comprises a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator. The plasma processing system also comprises means for frequency tuning the high-frequency generator using a probe signal that is concurrently applied with the power applied to the plasma chamber at the primary frequency.

Status:
Application
Type:

Utility

Filling date:

17 Feb 2021

Issue date:

10 Jun 2021