Advanced Energy Industries, Inc.
RATE ENHANCED PULSED DC SPUTTERING SYSTEM

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Abstract:

A sputtering system and method are disclosed. The system includes first power source coupled between a first and second power leads, and the first power source provides a first voltage that alternates between positive and negative during each of multiple cycles. The system also includes a second power source coupled between the second power lead and a third power lead, and the second power source provides a second voltage that alternates between positive and negative during each of the multiple cycles. A controller of the system controls the first power source and the second power source to phase-synchronize the first voltage with the second voltage, so both, the first voltage and the second voltage, are simultaneously negative during a portion of each cycle and simultaneously positive during another portion of each cycle.

Status:
Application
Type:

Utility

Filling date:

15 Dec 2020

Issue date:

15 Apr 2021