Atomera Incorporated
Semiconductor devices including hyper-abrupt junction region including a superlattice

Last updated:

Abstract:

A semiconductor device may include a substrate and a hyper-abrupt junction region carried by the substrate. The hyper-abrupt junction region may include a first semiconductor layer having a first conductivity type, a superlattice layer on the first semiconductor layer, and a second semiconductor layer on the superlattice layer and having a second conductivity type different than the first conductivity type. The first, second, and the superlattice layers may be U-shaped. The semiconductor device may further include a gate dielectric layer on the second semiconductor layer of the hyper-abrupt junction region, a gate electrode on the gate dielectric layer, and spaced apart source and drain regions adjacent the hyper-abrupt junction region.

Status:
Grant
Type:

Utility

Filling date:

17 Jul 2019

Issue date:

3 Nov 2020