Atomera Incorporated
METHOD FOR MAKING A SEMICONDUCTOR DEVICE INCLUDING A SUPERLATTICE HAVING NITROGEN DIFFUSED THEREIN
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Abstract:
A method for making a semiconductor device may include forming a superlattice layer and an adjacent semiconductor layer. The superlattice layer may include a plurality of stacked groups of layers, with each group of layers comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The method may further include diffusing nitrogen into the superlattice layer.
Status:
Application
Type:
Utility
Filling date:
31 Oct 2018
Issue date:
30 Apr 2020