Onto Innovation Inc.
System and method for optimizing a lithography exposure process

Last updated:

Abstract:

A method for correcting misalignments is provided. An alignment for each device of a group of devices mounted on a substrate is determined. An alignment error for the group of devices mounted on the substrate is determined based on the respective alignment for each device. One or more correction factors are calculated based on the alignment error. The alignment error is corrected based on the one or more correction factors.

Status:
Grant
Type:

Utility

Filling date:

28 Sep 2018

Issue date:

21 Sep 2021