Veeco Instruments Inc.
Apparatus and method for the minimization of undercut during a UBM etch process
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Abstract:
A semiconductor etch process is provided in which an undercut is minimized during an etch process through tight control of etch profile, recognition of etch completion, and minimization of over etch time to increase productivity.
Status:
Grant
Type:
Utility
Filling date:
20 Jun 2019
Issue date:
11 May 2021