Veeco Instruments Inc.
Laser-assisted atomic layer deposition of 2D metal chalcogenide films

Abstract:

Methods of forming 2D metal chalcogenide films using laser-assisted atomic layer deposition are disclosed. A direct-growth method includes: adhering a layer of metal-bearing molecules to the surface of a heated substrate; then reacting the layer of metal-bearing molecules with a chalcogenide-bearing radicalized precursor gas delivered using a plasma to form an amorphous 2D film of the metal chalcogenide; then laser annealing the amorphous 2D film to form a crystalline 2D film of the metal chalcogenide, which can have the form MX or MX.sub.2, where M is a metal and X is the chalcogenide. An indirect growth method that includes forming an MO.sub.3 film is also disclosed.