| Utility: Moment cancelling pad raising mechanism in wafer positioning pedestal for semiconductor processing Filling date: 6 Sep 2025 Issue date: 22 Dec 2020 | 5 Feb 2020 | 22 Dec 2020 |
| Utility: Systems and methods for correcting non-uniformities in plasma processing of substrates Filling date: 6 Sep 2025 Issue date: 22 Dec 2020 | 9 Jul 2019 | 22 Dec 2020 |
| Utility: Apparatus for purging semiconductor process chamber slit valve opening Filling date: 6 Sep 2025 Issue date: 22 Dec 2020 | 19 Sep 2018 | 22 Dec 2020 |
| Utility: Controlling showerhead heating via resistive thermal measurements Filling date: 6 Sep 2025 Issue date: 22 Dec 2020 | 8 Aug 2018 | 22 Dec 2020 |
| Utility: REPLACEABLE AND/OR COLLAPSIBLE EDGE RING ASSEMBLIES FOR PLASMA SHEATH TUNING INCORPORATING EDGE RING POSITIONING AND CENTERING FEATURES Filling date: 6 Sep 2025 Issue date: 17 Dec 2020 | 10 Sep 2018 | 17 Dec 2020 |
| Utility: Three or more states for achieving high aspect ratio dielectric etch Filling date: 6 Sep 2025 Issue date: 8 Dec 2020 | 21 Nov 2019 | 8 Dec 2020 |
| Utility: MOVING SUBSTRATE TRANSFER CHAMBER Filling date: 6 Sep 2025 Issue date: 3 Dec 2020 | 15 Feb 2019 | 3 Dec 2020 |
| Utility: Systems and methods for tuning an impedance matching network in a step-wise fashion Filling date: 6 Sep 2025 Issue date: 1 Dec 2020 | 23 Mar 2020 | 1 Dec 2020 |
| Utility: Connector for substrate support with embedded temperature sensors Filling date: 6 Sep 2025 Issue date: 1 Dec 2020 | 27 Mar 2018 | 1 Dec 2020 |
| Utility: PECVD deposition system for deposition on selective side of the substrate Filling date: 6 Sep 2025 Issue date: 1 Dec 2020 | 31 Aug 2017 | 1 Dec 2020 |
| Utility: Edge ring assembly for improving feature profile tilting at extreme edge of wafer Filling date: 6 Sep 2025 Issue date: 1 Dec 2020 | 8 Jul 2016 | 1 Dec 2020 |
| Utility: SYSTEM AND METHOD FOR EDGE RING WEAR COMPENSATION Filling date: 6 Sep 2025 Issue date: 26 Nov 2020 | 30 Nov 2018 | 26 Nov 2020 |
| Utility: Direct drive RF circuit for substrate processing systems Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 6 Dec 2019 | 24 Nov 2020 |
| Utility: Method of achieving high selectivity for high aspect ratio dielectric etch Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 19 Nov 2019 | 24 Nov 2020 |
| Utility: Method of feature exaction from time-series of spectra to control endpoint of process Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 16 Apr 2019 | 24 Nov 2020 |
| Utility: Compensating chamber and process effects to improve critical dimension variation for trim process Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 2 Aug 2018 | 24 Nov 2020 |
| Utility: Selective atomic layer etching Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 26 Jun 2018 | 24 Nov 2020 |
| Utility: Conformality modulation of metal oxide films using chemical inhibition Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 25 Apr 2018 | 24 Nov 2020 |
| Utility: Method for etching features in a stack Filling date: 6 Sep 2025 Issue date: 24 Nov 2020 | 31 Oct 2017 | 24 Nov 2020 |
| Utility: METAL LINER PASSIVATION AND ADHESION ENHANCEMENT BY ZINC DOPING Filling date: 6 Sep 2025 Issue date: 19 Nov 2020 | 4 Aug 2020 | 19 Nov 2020 |
| Utility: LOW RESISTIVITY FILMS CONTAINING MOLYBDENUM Filling date: 6 Sep 2025 Issue date: 19 Nov 2020 | 27 Jul 2020 | 19 Nov 2020 |
| Utility: Ring Structures and Systems for Use in a Plasma Chamber Filling date: 6 Sep 2025 Issue date: 19 Nov 2020 | 15 Dec 2017 | 19 Nov 2020 |
| Utility: Substrate processing chamber including conical surface for reducing recirculation Filling date: 6 Sep 2025 Issue date: 17 Nov 2020 | 30 Aug 2019 | 17 Nov 2020 |
| Utility: Method to clean SnO.sub.2 film from chamber Filling date: 6 Sep 2025 Issue date: 17 Nov 2020 | 9 Aug 2018 | 17 Nov 2020 |
| Utility: Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride films Filling date: 6 Sep 2025 Issue date: 17 Nov 2020 | 20 Jul 2018 | 17 Nov 2020 |
| Utility: SURFACE MODIFIED DEPTH CONTROLLED DEPOSITION FOR PLASMA BASED DEPOSITION Filling date: 6 Sep 2025 Issue date: 12 Nov 2020 | 24 Jul 2020 | 12 Nov 2020 |
| Utility: Vacuum-integrated hardmask processes and apparatus Filling date: 6 Sep 2025 Issue date: 10 Nov 2020 | 30 Nov 2018 | 10 Nov 2020 |
| Utility: Atomic layer etch, reactive precursors and energetic sources for patterning applications Filling date: 6 Sep 2025 Issue date: 10 Nov 2020 | 17 Apr 2018 | 10 Nov 2020 |
| Utility: Feedback control system for iterative etch process Filling date: 6 Sep 2025 Issue date: 10 Nov 2020 | 22 Feb 2018 | 10 Nov 2020 |
| Utility: Lower plasma-exclusion-zone rings for a bevel etcher Filling date: 6 Sep 2025 Issue date: 10 Nov 2020 | 29 Jun 2017 | 10 Nov 2020 |
| Utility: Self-aligned multi-patterning process flow with ALD gapfill spacer mask Filling date: 6 Sep 2025 Issue date: 10 Nov 2020 | 11 Nov 2016 | 10 Nov 2020 |
| Utility: Substrate support with increasing areal density and corresponding method of fabricating Filling date: 6 Sep 2025 Issue date: 10 Nov 2020 | 27 Jul 2016 | 10 Nov 2020 |
| Utility: EX SITU COATING OF CHAMBER COMPONENTS FOR SEMICONDUCTOR PROCESSING Filling date: 6 Sep 2025 Issue date: 5 Nov 2020 | 22 Jul 2020 | 5 Nov 2020 |
| Utility: Controller for Controlling Core Critical Dimension Variation Using Flash Trim Sequence Filling date: 6 Sep 2025 Issue date: 5 Nov 2020 | 21 Jul 2020 | 5 Nov 2020 |
| Utility: Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring Filling date: 6 Sep 2025 Issue date: 3 Nov 2020 | 18 Mar 2020 | 3 Nov 2020 |
| Utility: Selective growth of SIO2 on dielectric surfaces in the presence of copper Filling date: 6 Sep 2025 Issue date: 3 Nov 2020 | 18 Sep 2019 | 3 Nov 2020 |
| Utility: Systems for cooling RF heated chamber components Filling date: 6 Sep 2025 Issue date: 3 Nov 2020 | 2 May 2018 | 3 Nov 2020 |
| Utility: Directional deposition on patterned structures Filling date: 6 Sep 2025 Issue date: 3 Nov 2020 | 13 Apr 2018 | 3 Nov 2020 |
| Utility: Substrate processing chamber including multiple gas injection points and dual injector Filling date: 6 Sep 2025 Issue date: 3 Nov 2020 | 5 Jan 2017 | 3 Nov 2020 |
| Utility: Ion beam etch without need for wafer tilt or rotation Filling date: 6 Sep 2025 Issue date: 3 Nov 2020 | 8 Jan 2015 | 3 Nov 2020 |
| Utility: MATCHED TCR JOULE HEATER DESIGNS FOR ELECTROSTATIC CHUCKS Filling date: 6 Sep 2025 Issue date: 22 Oct 2020 | 6 Jul 2020 | 22 Oct 2020 |
| Utility: DC BIAS CIRCUIT AND GAS DELIVERY SYSTEM FOR SUBSTRATE PROCESSING SYSTEMS Filling date: 6 Sep 2025 Issue date: 22 Oct 2020 | 30 Jun 2020 | 22 Oct 2020 |
| Utility: SYSTEMS AND METHODS FOR SUPPRESSING PARASITIC PLASMA AND REDUCING WITHIN-WAFER NON-UNIFORMITY Filling date: 6 Sep 2025 Issue date: 22 Oct 2020 | 4 May 2020 | 22 Oct 2020 |
| Utility: RF PULSING WITHIN PULSING FOR SEMICONDUCTOR RF PLASMA PROCESSING Filling date: 6 Sep 2025 Issue date: 22 Oct 2020 | 28 Nov 2018 | 22 Oct 2020 |
| Utility: Wafer chuck assembly Filling date: 6 Sep 2025 Issue date: 20 Oct 2020 | 10 Dec 2018 | 20 Oct 2020 |
| Utility: High-power radio-frequency spiral-coil filter Filling date: 6 Sep 2025 Issue date: 20 Oct 2020 | 22 Mar 2018 | 20 Oct 2020 |
| Utility: Upper plasma-exclusion-zone rings for a bevel etcher Filling date: 6 Sep 2025 Issue date: 20 Oct 2020 | 29 Jun 2017 | 20 Oct 2020 |
| Utility: Deposition apparatus including an isothermal processing zone Filling date: 6 Sep 2025 Issue date: 20 Oct 2020 | 3 Jul 2013 | 20 Oct 2020 |
| Utility: ATOMIC LAYER DEPOSITION AND ETCH IN A SINGLE PLASMA CHAMBER FOR CRITICAL DIMENSION CONTROL Filling date: 6 Sep 2025 Issue date: 15 Oct 2020 | 25 Jun 2020 | 15 Oct 2020 |
| Utility: SUBSTRATE PEDESTAL INCLUDING BACKSIDE GAS-DELIVERY TUBE Filling date: 6 Sep 2025 Issue date: 15 Oct 2020 | 30 Apr 2020 | 15 Oct 2020 |
