| Utility: FLOW THROUGH LINE CHARGE VOLUME Filling date: 6 Sep 2025 Issue date: 23 Apr 2020 | 19 Dec 2019 | 23 Apr 2020 |
| Utility: ANTIMONY CO-DOPING WITH PHOSPHORUS TO FORM ULTRASHALLOW JUNCTIONS USING ATOMIC LAYER DEPOSITION AND ANNEALING Filling date: 6 Sep 2025 Issue date: 23 Apr 2020 | 17 Dec 2019 | 23 Apr 2020 |
| Utility: REDUCTION OF SIDEWALL NOTCHING FOR HIGH ASPECT RATIO 3D NAND ETCH Filling date: 6 Sep 2025 Issue date: 23 Apr 2020 | 19 Oct 2018 | 23 Apr 2020 |
| Utility: Selective deposition of silicon oxide Filling date: 6 Sep 2025 Issue date: 21 Apr 2020 | 30 Nov 2018 | 21 Apr 2020 |
| Utility: Doped ALD films for semiconductor patterning applications Filling date: 6 Sep 2025 Issue date: 21 Apr 2020 | 28 Sep 2016 | 21 Apr 2020 |
| Utility: Adjustment of power and frequency based on three or more states Filling date: 6 Sep 2025 Issue date: 21 Apr 2020 | 26 Jul 2016 | 21 Apr 2020 |
| Utility: Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter Filling date: 6 Sep 2025 Issue date: 21 Apr 2020 | 11 Mar 2013 | 21 Apr 2020 |
| Utility: DESIGNER ATOMIC LAYER ETCHING Filling date: 6 Sep 2025 Issue date: 16 Apr 2020 | 17 Dec 2019 | 16 Apr 2020 |
| Utility: CONTROL OF WAFER BOW IN MULTIPLE STATIONS Filling date: 6 Sep 2025 Issue date: 16 Apr 2020 | 16 Dec 2019 | 16 Apr 2020 |
| Utility: SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET Filling date: 6 Sep 2025 Issue date: 16 Apr 2020 | 13 Dec 2019 | 16 Apr 2020 |
| Utility: RF ANTENNA PRODUCING A UNIFORM NEAR-FIELD POYNTING VECTOR Filling date: 6 Sep 2025 Issue date: 16 Apr 2020 | 15 Jul 2019 | 16 Apr 2020 |
| Utility: Showerhead Faceplate Having Flow Apertures Configured for Hollow Cathode Discharge Suppression Filling date: 6 Sep 2025 Issue date: 16 Apr 2020 | 10 Oct 2018 | 16 Apr 2020 |
| Utility: Systems and methods for tuning an impedance matching network in a step-wise fashion Filling date: 6 Sep 2025 Issue date: 14 Apr 2020 | 9 May 2019 | 14 Apr 2020 |
| Utility: Combiner and distributor for adjusting impedances or power across multiple plasma processing stations Filling date: 6 Sep 2025 Issue date: 14 Apr 2020 | 16 Jan 2019 | 14 Apr 2020 |
| Utility: Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate Filling date: 6 Sep 2025 Issue date: 14 Apr 2020 | 4 Sep 2018 | 14 Apr 2020 |
| Utility: Planar substrate edge contact with open volume equalization pathways and side containment Filling date: 6 Sep 2025 Issue date: 14 Apr 2020 | 13 Feb 2017 | 14 Apr 2020 |
| Utility: Systems and methods for controlling a plasma edge region Filling date: 6 Sep 2025 Issue date: 14 Apr 2020 | 24 Jun 2016 | 14 Apr 2020 |
| Utility: Adjustable side gas plenum for edge rate control in a downstream reactor Filling date: 6 Sep 2025 Issue date: 14 Apr 2020 | 11 May 2016 | 14 Apr 2020 |
| Utility: COOLING SYSTEM FOR RF POWER ELECTRONICS Filling date: 6 Sep 2025 Issue date: 9 Apr 2020 | 6 Dec 2019 | 9 Apr 2020 |
| Utility: DIRECT DRIVE RF CIRCUIT FOR SUBSTRATE PROCESSING SYSTEMS Filling date: 6 Sep 2025 Issue date: 9 Apr 2020 | 6 Dec 2019 | 9 Apr 2020 |
| Utility: Systems and Methods for UV-Based Suppression of Plasma Instability Filling date: 6 Sep 2025 Issue date: 9 Apr 2020 | 5 Dec 2019 | 9 Apr 2020 |
| Utility: REFLECTOMETER TO MONITOR SUBSTRATE MOVEMENT Filling date: 6 Sep 2025 Issue date: 9 Apr 2020 | 5 Oct 2018 | 9 Apr 2020 |
| Utility: Method to recess cobalt for gate metal application Filling date: 6 Sep 2025 Issue date: 7 Apr 2020 | 30 Aug 2019 | 7 Apr 2020 |
| Utility: Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring Filling date: 6 Sep 2025 Issue date: 7 Apr 2020 | 19 Oct 2018 | 7 Apr 2020 |
| Utility: Selective deposition of SiN on horizontal surfaces Filling date: 6 Sep 2025 Issue date: 7 Apr 2020 | 1 Aug 2018 | 7 Apr 2020 |
| Utility: Flow assisted dynamic seal for high-convection, continuous-rotation plating Filling date: 6 Sep 2025 Issue date: 7 Apr 2020 | 24 Jul 2018 | 7 Apr 2020 |
| Utility: System implementing machine learning in complex multivariate wafer processing equipment Filling date: 6 Sep 2025 Issue date: 7 Apr 2020 | 30 Apr 2018 | 7 Apr 2020 |
| Utility: VACUUM PUMP PROTECTION AGAINST DEPOSITION BYPRODUCT BUILDUP Filling date: 6 Sep 2025 Issue date: 2 Apr 2020 | 26 Sep 2019 | 2 Apr 2020 |
| Utility: METHOD FOR SELECTIVE DEPOSITION USING A BASE-CATALYZED INHIBITOR Filling date: 6 Sep 2025 Issue date: 2 Apr 2020 | 2 Oct 2018 | 2 Apr 2020 |
| Utility: Ceramic Foam for Helium Light-Up Suppression Filling date: 6 Sep 2025 Issue date: 2 Apr 2020 | 1 Oct 2018 | 2 Apr 2020 |
| Utility: ASYMMETRIC WAFER BOW COMPENSATION BY PHYSICAL VAPOR DEPOSITION Filling date: 6 Sep 2025 Issue date: 2 Apr 2020 | 28 Sep 2018 | 2 Apr 2020 |
| Utility: ASYMMETRIC WAFER BOW COMPENSATION BY CHEMICAL VAPOR DEPOSITION Filling date: 6 Sep 2025 Issue date: 2 Apr 2020 | 28 Sep 2018 | 2 Apr 2020 |
| Utility: Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process Filling date: 6 Sep 2025 Issue date: 2 Apr 2020 | 28 Sep 2018 | 2 Apr 2020 |
| Utility: Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition Filling date: 6 Sep 2025 Issue date: 31 Mar 2020 | 14 Dec 2016 | 31 Mar 2020 |
| Utility: Systems and Methods for Controlling Plasma Instability in Semiconductor Fabrication Filling date: 6 Sep 2025 Issue date: 26 Mar 2020 | 27 Nov 2019 | 26 Mar 2020 |
| Utility: Methods And Systems For Determining A Fault In A Gas Heater Channel Filling date: 6 Sep 2025 Issue date: 26 Mar 2020 | 7 Oct 2019 | 26 Mar 2020 |
| Utility: DUAL FREQUENCY SILANE-BASED SILICON DIOXIDE DEPOSITION TO MINIMIZE FILM INSTABILITY Filling date: 6 Sep 2025 Issue date: 26 Mar 2020 | 26 Sep 2018 | 26 Mar 2020 |
| Utility: LONG-LIFE HIGH-POWER TERMINALS FOR SUBSTRATE SUPPORT WITH EMBEDDED HEATING ELEMENTS Filling date: 6 Sep 2025 Issue date: 26 Mar 2020 | 20 Sep 2018 | 26 Mar 2020 |
| Utility: Silicon-based deposition for semiconductor processing Filling date: 6 Sep 2025 Issue date: 24 Mar 2020 | 20 Apr 2017 | 24 Mar 2020 |
| Utility: Temperature control in RF chamber with heater and air amplifier Filling date: 6 Sep 2025 Issue date: 24 Mar 2020 | 19 Dec 2016 | 24 Mar 2020 |
| Utility: THREE OR MORE STATES FOR ACHIEVING HIGH ASPECT RATIO DIELECTRIC ETCH Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 21 Nov 2019 | 19 Mar 2020 |
| Utility: VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 21 Nov 2019 | 19 Mar 2020 |
| Utility: MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE MODULATION Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 21 Nov 2019 | 19 Mar 2020 |
| Utility: METHOD OF ACHIEVING HIGH SELECTIVITY FOR HIGH ASPECT RATIO DIELECTRIC ETCH Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 19 Nov 2019 | 19 Mar 2020 |
| Utility: Fiducial-Filtering Automatic Wafer Centering Process and Associated System Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 14 Sep 2018 | 19 Mar 2020 |
| Utility: Methods and Systems for Controlling Wafer Fabrication Process Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 14 Sep 2018 | 19 Mar 2020 |
| Utility: AUTO-CALIBRATED PROCESS INDEPENDENT FEEDFORWARD CONTROL Filling date: 6 Sep 2025 Issue date: 19 Mar 2020 | 13 Sep 2018 | 19 Mar 2020 |
| Utility: Mass flow controller for substrate processing Filling date: 6 Sep 2025 Issue date: 17 Mar 2020 | 9 Mar 2018 | 17 Mar 2020 |
| Utility: Multi-radiofrequency impedance control for plasma uniformity tuning Filling date: 6 Sep 2025 Issue date: 17 Mar 2020 | 29 Jan 2018 | 17 Mar 2020 |
| Utility: Systems and methods for controlling substrate approach toward a target horizontal plane Filling date: 6 Sep 2025 Issue date: 17 Mar 2020 | 17 Mar 2017 | 17 Mar 2020 |
